Zyvex Litho 1

Sub-nm Resolution Lithography System

View brochure here

Making Atomic Precision Lithography a Reality

  • UHV system for STM Lithography 
  • Precursor Gas Dosing and Si MBE 
  • Digital Vector Lithography 
  • Automation and Scripting
This exposure of 7.7nm (10 pixel) squares would not be possible without sub-nm resolution and precision.  

Technical Specifications: 

ZyVector Lithography Controller 

  • 20-bit DSP 
  • Provides real-time control of the tunneling feedback loop and bias voltage. and precise tip motion across the surface. 
  • Piezo Driver 
  • Pre-amp bias range control for Omicron preamp amplified current input Fits Omicron VT STM preamp and PIC cabling. 

Scanning 

  • Omicron VT STM: 9500 nm. 
  • Minimum scan bit size: 10 pm. 
  • Z range: 1.3 μm.
  • Minimum bit size: 1 pm. 

System Capabilities 

  • Heater station for Sample Preparation 
  • Si MBE source 
  • Precursor gas dosing chambers

Advanced Position Controls 

  • Local piezo tube calibration based on lattice recognition, including determination of lattice angle relative to piezo tube axes. 
  • Lattice phase recognition for precise lithography positioning. 
  • Creep and Hysteresis position correction (CHC) in xyz. 
  • Initial optimization of creep and hysteresis over scan range during installation. (Fine optimization by user required periodically.) 

Hydrogen Depassivation Lithography (HDL) 

  • Two spot size modes available: 
    • AP mode ( single-dimer-row line width) 
    • FE mode ( wide line width, rough edges) 

Advanced Scripting Capabilities 

  • We provide scripts based on Python for test HDL patterns, creep correction calibration, lithography parameter calibration, etc. 
  • User-written scripts can be easily incorporated and run using command line interface or drop-down menu.