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The MNE CPH 2018 micrograph contest is now closed. Please see all 2018 award winners and entries below. 

The rules include the following:

  • Entries have to be of a single image taken with a microscope and should not be significantly altered.
  • There is no restriction with respect to the subject matter.
  • Electron and ion micrographs have to be black and white.

In 2018, 40 entries were submitted. The entries came from: Denmark, Germany, Italy, Netherlands, Norway, Portugal, Saudi Arabia, Spain, and Switzerland.

The judges were:

  • Gaby Grützner – Managing Director of Micro Resist Technologies and long time member of the MNE International Steering Committee.
  • Irene Fernandez-Cuesta – Staff Scientist University of Hamburg and former winner of Micro Nano graph contest.
  • Stefano Dallorto – Molecular Foundry, wanted to win in 2017 – Judge in 2018!

There were 4 awards:

  • 1st Place
  • 2nd Place
  • 3rd Place
  • MNE People’s Choice

There were also 7 honorable mentions given.

To download a PDF with all 40 entries, click HERE.


1st Place

Title: The question of life: which direction to go?

Description: Sub-wavelength diamond nanosctructureto control the light field at the microscale.

Magnification: 19000 x

Instrument: Zeiss Supra 55 VP

Submitted by: Gediminas Seniutinas

Affiliation: Paul ScherrerInstitute


2nd Place

Title: What’s under the rug?

Description: EBL exposure with too high dose can result in carpets of nanopillars instead of free standing pillars. When the carpet delaminates it is possible to see all sides of the pillars.

Magnification: 2000x

Instrument: FEI ApreoSEM

Submitted by: Jakob Vinje

Affiliation: Norwegian University of Science and Technology (NTNU)


3rd Place

Title: A Game of Go

Description: Trapping device used to isolate individual silica microspheres from agglomerates.

Magnification: 600

Instrument: JEOL JSM-6400 (SEM)

Submitted by: Nathaniel Berneman & Ignaas Jimidar

Affiliation: University of Twente & Vrije Universiteit Brussel


MNE People’s Choice

Title: The sun will rise, and we will try again

Description: SEM image of a sacrificial stencil mask for on polymer metal evaporation. The structure was fabricated using 2Photon Lithography on two different resist layers

Magnification: 4 kX

Instrument: SEM Helios Nano Lab 600i

Submitted by: Salvatore Puce

Affiliation: Universitàdel Salento – iit


Honorable Mention

Title: Tulips in Love

Description: SEM of silicon grating. A crazy metal assisted chemical etching formed some tulips that eventually fall in love

Magnification: 8000 X

Instrument: SEM Zeiss Supra VP55

Submitted by: Lucia Romano

Affiliation: PSI


Title: Perfectionist’s nightmare

Description: Highly ordered Al-doped ZnO tube structures fabricated by deep UV lithography, ALD and deep reactive ion etching. The thicknessof tube walls canbeas thinas 20 nm!

Magnification: 15.72k X

Instrument: SEM Zeiss Supra 60VP

Submitted by: Evgeniy Shkondin

Affiliation: DTU-Fotonik


Title: Austrian winter landscape at night, After a couple of wines and schnaps

Description: Crystallized proteins and salts on a stamp for nanocontactprinting. Should be homogeneous. Darkfieldmicroscope image w/o colouring.

Magnification: 10x

Instrument: Dark field microscope

Submitted by: Marco Lindner

Affiliation: Stratec Consumables GmbH


Title: I made it! I will be a girl!

Description: TiO2 nanoparticles on a wafer after RIE process.

Magnification: 207.15 kX

Instrument: SEM Zeiss Supra 60VP

Submitted by: Evgeniy Shkondin

Affiliation: DTU-Fotonik


Title: The Ghost of MNE!

Description: Salt and DNA dehydrated residuals suspended and concentrated over a superhydrophobic device.

Magnification: 1000x

Instrument: Quanta 200, FEI

Submitted by: Monica Marini

Affiliation: KAUST


Title: NordicDesigngoesNano

Description: Hexagonal lattice of Au nanoasterisksduring lift-off

Magnification: 50k X

Instrument: FE-SEM LEO 1530

Submitted by: Ana Conde-Rubio

Affiliation: University of Barcelona


Title: After this great summer, Winter is coming!

Description: SEM of a laser-modified chromium layer on fused silica

Magnification: 1k

Instrument: Carl Zeiss Ultra 55

Submitted by: Joachim Zajadacz

Affiliation: Leibniz Institute of Surface Engineering