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MNE 2005 Micro Nano Graph Contest
“ A good Micrograph is worth more than the MegaByte it consumes.”Entries Presented by Dr. John Randall – Zyvex Labs
The rules include the following:
• Entries have to be of a single image taken with a microscope and not significantly altered.
• There is no restriction with respect to the subject matter.
• Electron and ion micrographs have to be black and white.
In 2005, the first year in which the Micro Nano Graph contest was held at MNE, 41 entries were submitted. There were many outstanding micrographs. The work represented in the submitted micrographs covered a wide range of fields including micro mechanical, photonic, and integrated circuit fabrication, chemical and dry etching, laser optics, carbon nanotube structures, carbon nanotube growth experiments, biological samples, material science experiments and, of course, e-beam, ion beam, and nano imprint lithography experiments.
The panel of judges who selected the award winners were:
- Roxann Engelstad – University of Maryland USA
• Jos Benschop – ASML the Netherlands
• Hiroshi Arimoto – Selete, Japan
The Awards are:
• First Prize
• Second Prize
• Third Prize
The judges also selected 3 Honorable Mentions.
All 2005 Entries (with original titles)
Judges exercised their prerogative to change the micrograph titles if it pleased them.
First Prize
Title: Who invited the Irish?
Description:
Si/Cr bilayer has been patterned into a “Siemensstern” with rotational symmetry on Si substrate. After selective etching of the substrate underneath, the rings formed owing to the tensile strain of the Cr layer.
Magnification (3″x4″ image): 2.14KX
Instrument: Zeiss SUPRA 55VP
Submitted by: Li Zhang
Affiliation: Paul Scherrer Institute Switzerland
Second Prize
Title: May I exhale now?
Description:
Polystyrene nanoparticles with a diameter of 500 nm printed on top of a 100µm glass bead using a process similar to micro-contact printing.
Magnification (3″x4″ image): Scale on the picture
Instrument: LEO SEM 1550
Submitted by: Laurent Malaquin
Affiliation: IBM Research, Zurich Research Laboratory Switzerland
Third Prize
Title: “” It’s a boy!
Description:
Part of a Au nanowire which was electro-chemically deposited on patterned silicon substrate
Magnification (3″x4″ image): 270KX
Instrument: JEOL JSM6340F
Submitted by: Ran Ji
Affiliation: Max Planck Institute (MPI) of microstructure physics Halle, Germany
Honorable Mention
Title: Birgit over troubled waters by Birgit
Description:
After an accidental lift -off of e-beam defined FOx-lines on SOI-substrate with subsequent ion-etching and SiO2 – sputter deposition the following structures were observed:
Magnification (3″x4″ image): 55KX
Instrument: JEOL JSM 6700F
Submitted by: Birgit Hadam
Affiliation: Institut für Halbleitertechnik (IHT), RWTH Aachen, Germany
Honorable Mention
Title: SEMATECH 2010 Logo aka Chastity Belt
Description: Focused electron beam induced deposition of Rh-containing composite.
Magnification (3″x4″ image): 10 KX
Instrument: Philips XL30 FEG
Submitted by: Tristan Bret
Affiliation: Institute of Applied Optics, Ecole Polytechnique Fédérale de Lausanne, Switzerland
Honorable Mention
Title: No brain, half a spine
Description:
silicon etched by gas chopping
Magnification (3″x4″ image):Scale on the picture
Instrument: Hitachi S-4000
Submitted by: Burkhard E. Volland
Affiliation: University of Kassel, Germany