SERVICES | NANOFABRICATION FOUNDRY

Zyvex Labs has developed nanofabrication processes that can be applied to a wide variety of nanotechnology projects. In particular we have patterning capabilities with unprecedented resolution and precision. We accomplish this with a modified Scanning Tunneling Microscope which does Hydrogen Depassivation Lithography (HDL), which is a variant of E-beam Lithography but has sub-nm resolution, critical dimension control and pattern placement accuracy. This technology is appliled primarily to Si surfaces and uses a sub-nm pixel (0.768nm) to define the patterns. This pixel is tied to the Si surface lattice and corresponds to a square that contains 4 Si atoms.

Figure 1 illustrates atomically precise patterns produced with HDL: (left) An open box 5 pixels (3.8nm) on a side; (center) four 6-pixel (4.5 nm) boxes, 20 pixels apart; (right) 5 boxes, each 2-pixels wide.

Background

We can use these patterns to do selective deposition of a number of materials including dopant atoms and metal oxides. The dopant atoms can be used to make nanoelectronic devices and the metal oxides can be used as etch masks to transfer the patterns into Si. For HDL, we are restricted to working on small 8x8mm silicon samples.

We also can provide patterning, etching, and deposition using a wide range of nanofabrication techniques on 4 and 6 inch wafers. If you know what you want fabricated but need help designing a process to create the desired device or structure, we can help you realize your nanotechnology research or product goals. We have a very experienced staff with greater than > 5 decades of micro and nanofabrication experience.

For more information, please contact info@zyvexlabs.com.

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