John N. Randall, CEO of Zyvex Labs, Executive VP of Teliatry, Executive VP at NanoRetina, Adjunct Professor at UT Dallas, and Fellow of the AVS, IEEE, and Micro Nano Engineering Society, has 40 years of experience in Micro- and Nano- Fabrication. He has attracted over $48M in research contracts to Zyvex and resulting products have generated revenues of over $750M. He joined Zyvex in March of 2001 after 15 years at Texas Instruments where he worked in high resolution processing for integrated circuits, MEMS, and quantum effect devices. Prior to working at TI, John worked at MIT’s Lincoln Laboratory on ion beam and x-ray lithography. He has 126 articles published in refereed journals, more than 85 conference proceedings and other publications and has 36 issued US Patents with a total of 6350 citations on publications and patents.

  • CEO of Zyvex Labs (2020)
  • President of Zyvex Labs (2011–Present)
  • Vice President of Zyvex Labs (2007–2011)
  • Chief Technical Officer at Zyvex Corporation (2001–2007)
  • Senior Staff Scientist at Zyvex Corporation. Developing Micro- Electro Mechanical Systems (MEMS) and Nano- Electro Mechanical Systems (NEMS). (3/2001–5/2001)
  • Distinguished Member Technical Staff, Kilby Research Center Texas Instruments in Dallas, Texas. He was the Leader of the Poly Silicon Gate patterning Team which developed lithography and etching of sub-tenth micron gates for TI’s most advanced Integrated Circuit technology. (1998–2001)
  • Senior Member Technical Staff, TI Assignee to IMEC in Leuven Belgium. He worked on Optical Proximity Correction and other aspects of state-of-the-art optical Lithography. (1996–1998)
  • Senior Member Technical Staff, Nanoelectronics Branch Texas Instruments, Dallas, Texas. He developed high resolution processing techniques which resulted in several World’s First accomplishments including: Quantum Dot Diode, Quantum Well Resonant Tunneling Transistor, Lateral heterostructure tunneling transistor, and room temperature quantum integrated circiut. (1985–1996)
  • Member Technical Staff, M.I.T. Lincoln Laboratory in Lexington, Massachusetts. Developed ultra-high resolution semiconductor processing techniques including masked ion beam lithography which produced 80nm lines and spaces. (1981–1985)
  • Instructor in Electrical Engineering Dept. Univ. of Houston. Where he taught Electro Magnetics, Material Science, Linear Algebra, Programming, and Numerical Methods. (1978–1981)
  • BS in Electrical Engineering, (Cum Laude) Honors Program, University of Houston (1975)
  • MS in Electrical Engineering, University of Houston (1977)
  • PhD in Electrical Engineering, University of Houston (1981)
  • 4,827,138: Filled Grid Mask Citations 10
  • 5,096,846: Method of Forming a Quantum Effect Switching Device Citations 3
  • 5,160,845: Alignment Technique for Masked Ion Beam Litho Citations 9
  • 5,335,649: Stretching device Citations 10
  • 5,346,851: Method of Fabricating Shannon Cell Circuits Citations 19
  • 5,447,873: Method of Making Universal Quantum Dot Logic Cell Citations 21
  • 5,504,347: Lateral resonant tunneling device having gate electrode aligned with tunneling barriers Citations 68
  • 5,529,862: Low Distortion Stencil Mask Citations 10
  • 5,529,952: Method of fabricating lateral resonant tunneling structure Citations 9
  • 5,593,908: Lateral Resonant Tunneling Citations 7
  • 5,618,383: Narrow lateral dimensioned microelectronic structures and method for forming same Citations 38
  • 5,665,997: Grated Landing Area to eliminate sticking of Micro-mechanical devices Citations 325
  • 5,763,121: Low Distortion Stencil Mask (a divisional application of 5,529,952) Citations 10
  • 5,783,840: Universal Quantum Dot Logic Cell (continuation of 5,447,873) Citations 40
  • 6,100,477: Recessed etch RF micro-electro-mechanical switch Citations 146
  • 6,139,483: Method of forming lateral resonant tunneling devices Citations 27
  • 6,553,558: Integrated circuit layout and verification method Citations 23
  • 6,634,018: Optical Proximity Correction Citations 90
  • 6,686,102: Two-exposure phase shift photolithography with improved inter-feature separation Citations 7
  • 6,686,300: Sub-critical-dimension integrated circuit features Citations 28
  • 6,813,378: Method for designing matrix paintings and determination of paint distribution Citations 5
  • 6,837,723: Self-actuating connector for coupling microcomponents Citations 8
  • 7,094,292: Mechanism for applying paint to canvas Citations 25
  • 7,326,293: Patterned Atomic Layer Epitaxy Citations 26
  • 7,799,132: Patterned Atomic Layer Epitaxy
  • 8,789,490: System and method of pointillist painting
  • 8,922,548: System and method of pointillist painting design
  • 9,329,201: Methods, devices, and systems for forming atomically precise structures Citations 10
  • 9,386,954: Method of fabricating a multi-electrode array Citations 8
  • 9,550,209: Divisional for System and method of pointillist painting
  • 9,867,979: Three-dimensional multi-electrode array
  • 10,495,665: Methods, devices and systems for scanning tunneling microscopy control system design Citations 6
  • 10,983,142: Depassivation lithography by scanning tunneling microscopy
  • 11,002,758: Rugged, single crystal wide-band-gap-material scanning-tunneling-microscopy/lithography tips
  • 11,313,787: Sensor device for biosensing and other applications
  • 12,078,654 Rugged, single crystal wide-band-gap-material scanning-tunneling-microscopy/lithography tips
  • International Symposium of Electron, Ion, and Photon Beams – Financial Trustee (2017-present)
  • Industrial Advisory Board, School of Engineering, Univ. of North Texas (2014–Present)
  • STEM Advisory Committee, Girl Scouts of NE Texas (2013–Present)
  • Adjunct Proessor, University of Texas at Dallas, (2012–Present)
  • Chairman of Judging, Tech Titan’s Award Gala (2012–Present)
  • Technology Roadmap Steering Committee, Foresight Nanotech Institute (2005–2010)
  • External Advisory Committee, Nano-Bio Interface Center, University of Pennsylvania (2004–2010)
  • Executive Committee, Industrial Advisory Board, Jonsson School of Engineering, UTDallas (2004–Present)
  • International Steering Committee of European Micro-Nano-Engineering Conference(1997–Present)
  • Imago Scientific Instruments Corporation Technical Advisory Board (2004)
  • Program committee of the SPIE Micro Lithography Conference (2000)
  • U.S. Editor of Micro Electronic Engineering Journal (1999–2000)
  • Advisory committee and webmaster of the International Conference on Electron Ion and Photon Beam Technologies and Nanofabrication (1996–2000)
  • President of the Texas Chapter of the American Vacuum Society (1993)
  • Program committee of the International Electron Devices Meeting, Technical Advisory Committee of the Advanced Lithography Consortium
  • Technical Advisory Committee of University of Maryland’s LIBRA Program
  • IEEE member
  • American Vacuum Society member
  • Tau Beta Pi: National Engineering Honor Society
  • Eta Kappa Nu: National E.E. Honor Society
  • Alpha Lamda Delta/Phi Eta Sigma: National Freshman Honor Society (Honorary Membership — Faculty Advisor)
  • Fellow of the IEEE (2015)
  • Senior Member of the IEEE (2012)
  • Disinguished Engineering Alumni Award – University of Houston (2010)
  • Fellow of the AVS (2009)
  • Elected Distinguished Member of Texas Instruments’ Technical Staff (2000)
  • Elected Conference Chairman for 1998 Gordon Conference on Nanostructure Fabrication (1996)
  • Elected Conference Chairman for 1995 International Conference on Electron, Ion, and Photon Beams (1993)
  • Elected Senior Member of the Technical Staff, Texas Instruments (1990)
  • Southwest Bell Outstanding Student Award (1975)
  • National Collegiate Judo Champion (1974 & 1975)

Dr. Randall has published over 125 articles in peer reviewed scientific journals, and over 86 conference proceedings and other publications.

Most of his publications are in the areas of:

Semiconductor lithography: such as optical, e-beam, ion-beam, x-ray, and Scanning Tunneling Microscopy based lithography.

Quantum devices and circuits: including quantum resonant tunneling devices, and quantum computing qubits.

He has also published papers on metrology, ohmic contacts, atomic layer epitaxy, reactive ion etching, micro electro mechanical systems (MEMS), and x-ray fluorescence analysis.

His h-index is 35 his i10-index is 113 and has a total of 6350 Citations.

Some representative examples include: “Reduction of Mask Induced CD Errors by Optical Proximity Correction”, John Randall, Alexander Tritchkov, Kurt Ronse, Rik Jonckheere, SPIE vol 3334 page 124-130 (1998) “Fifteen nanometer features by sidewall processing and pattern transfer” John N. Randall and Brian L. Newell, J.Vac.Sci.Technol. B12, 3631 (1994) “Prospects for Printing Very Large Scale Integration Circuits with Masked Ion Beam Lithography”, J. N. Randall, J.Vac.Sci.Technol. Vol A4, p.777, (1986) In the area of quantum devices and circuits, he has published approximately 50 papers. Some examples include: “Potential Nanoelectronic Integrated Circuit Technologies”, John Randall, Gary Frazier, Alan Seabaugh, Tom Broekaert, Microelectronics Engineering 32 15-30, 1996 “Resonant Tunneling Quantum Dot Diodes: Physics, Limitations, and Technological Prospects” James H. Luscombe, John N. Randall, and Ann Marie Bouchard, Proceedings of IEEE, vol 79, 1117, 1991 “Observation of Discrete Electronic States in a Zero-Dimensional Semiconductor Nanostructure”, M.A. Reed, J.N. Randall, R.J. Aggarwal, R.J. Matyi, T.M. Moore, and A.E. Wetsel, Phys.Rev.Lett. 60, 535 (1988) Dr. Randall has also published papers on metrology, ohmic contacts, atomic layer epitaxy, reactive ion etching, micro electro mechanical systems (MEMS), and x-ray fluorescence analysis.

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