Joshua joined Zyvex Labs in 2008 to work on tip-based atomically precise manufacturing (APM). In his role, Joshua has been instrumental in numerous fields extending from hydrogen depassivation lithography processing. Prior to joining Zyvex Labs, he focused on instrument development for atmospheric sensing aboard high altitude aircraft while at NOAA and for atomically resolved optical effects while a Beckman Fellow at University of Illinois.

Joshua has an AB in Psychology (1995) from Harvard University and a PhD in Physical Chemistry (2003) from University of Colorado.