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The 54th International Conference on “ A good Micrograph is worth more than the MegaByte it consumes.” Entries Presented by Dr. |
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The
rules include the following: In 2010, 88 entries were submitted. There were many outstanding micrographs. The work represented in the submitted micrographs covered a wide range of fields including micro mechanical, photonic, and integrated circuit fabrication, chemical and dry etching, carbon nanotube structures, carbon nanotube growth experiments, biological samples, material science experiments and, of course, e-beam, ion beam, and photo lithography experiments. The
panel of judges who selected the award winners were:
There were six awards:
There were 17 Honorable Mentions.
Judges
exercised their prerogative to liberally interpret the award categories,
change the micrograph titles, and even rotate the micrograph if it pleased
them. BEST ELECTRON MICROGRAPH
Title: Alaskan Oasis Description:Au electroplated structures in defective PMMA mold Magnification (3"x4" image): 20 kx Instrument (Make and Model): SEM Zeiss Supra 55VP Submitted by: Joan Vila-Comamala Affiliation: Paul Scherrer Institut (Switzerland) BEST ION MICROGRAPH
Title: I think it's down here. Description:These are the several of the small hairs that are found on the wing of a bee. The scaly nature of the membrane is also seen. Also, several of the hairs show a defect suspected to be a parasite egg. Magnification (3"x4" image): 2.4kX Instrument: Carl Zeiss, ORION Plus (He Ion Microscope) Submitted by: Shawn McVey and Dave Voci Affiliation: Carl Zeiss SMT BEST PHOTON MICROGRAPH
Title: Off Road Description:This is a bright field optical micrograph of poly(styrene-block-ferrocenyldimethylsilane) (PS-b-PFS) block copolymer thin film. The polymer was spin coated on a thin TEM membrane subjected to hybrid thermal/solvent annealing. This artistic structure appears due to the selective dewetting of the polymer from the thin TEM window (seen in the middle) which oscillates during the spin coating. Magnification: 100X Instrument: Zeiss optical microscope Submitted by: Muruganathan Ramanathan and Seth Darling Affiliation: Center for Nanoscale Materials, Argonne National Laboratory BEST VIDEO MICROGRAPH
MOST BIZARRE MICROGRAPH
Title: Bat Man Description:Unknown source of contamination on silicon wafer after PMMA resist strip. Magnification (3"x4" image): 70x Instrument (Make and Model): Zeiss Ultra55 Submitted by: Steven Hickman Affiliation: Cornell University
GRAND PRIZE
Title: Too Many Eggs for One Basket Description: Poly(lactic acid) microspheres formed by a W/O/W emulsion and a three leaf clover blade.
Magnification (3"x4" image): 1000X instrument (Make and Model): FEI Sirion XL30 Submitted by: Scott Braswell Affiliation: University of Washington - NTUF HONORABLE MENTION
Title: Icelandic Nightmare Description: Talbot lithography using 1x full field mask aligner with 100 µm exposure gap Magnification (3"x4" image): 7260x Instrument (Make and Model): ZEISS Ultra Plus Submitted by: Michael Hornung & Uwe Vogler Affiliation: SUSS MicroTec
HONORABLE MENTION
Title: Princess and the Pea Description: Inverse opal photonic crystal bending over some particles Magnification (3"x4" image): 2500X Instrument (Make and Model): Hitachi S4800 FESEM Submitted by: Leo Tom Varghese, Li Fan Affiliation: Birck Nanotechnology Center, Purdue University
HONORABLE MENTION
Title: The White Cliffs of Silica Description: Side view of self assembled silica particles showing 100 crystal orientation Magnification (3"x4" image): 3000X Instrument (Make and Model): Hitachi S4800 FESEM Submitted by: Leo Tom Varghese, Li Fan Affiliation: Birck Nanotechnology Center, Purdue University
HONORABLE MENTION
Title: ET Phone Home Description: SEM picture of a DNA fork fomed on PDMS after evaporation of a DNA solution containing Triton Magnification (3"x4" image): X2000 Instrument (Make and Model): SEM Hitachi 4000 Submitted by: J. Cordeiro Affiliation: BioColloNa LTM CNRS HONORABLE MENTION
Title: Your Brain on Politics Description: This is a bright field optical micrograph of poly(styrene-block-ferrocenyldimethylsilane) (PS-b-PFS) block copolymer thin film. Polymer film thickness and the mode of annealing brings out a variety of structures which is currently being explored as an etch mask for mesoscale lithography. Magnification: 100X Instrument: Zeiss optical microscope (cross-polarization mode) Submitted by: Muruganathan Ramanathan and Seth Darling Affiliation: Center for Nanoscale Materials, Argonne National Laboratory
HONORABLE MENTION
Title: Under the bleachers Description: Funny bottom structures revealed beneath the upper layer after it was etched out. Magnification (3"x4" image): 16kx Instrument (JEO L JSM-6700) Submitted by: Yehiel Gotkis & Alan Brodie Affiliation: KLA-Tencor
HONORABLE MENTION
Title: REALLY short stack Description: Platelets observed stacked up inside a blood vessel in a section of bone Magnification (3"x4" image): 10kX Instrument (Make and Model): Submitted by: Larry Scipioni Affiliation: Carl Zeiss SMT, Inc.
HONORABLE MENTION
Title: Let's get rid of it Description: Top-down view of a carbon-nanotube micro-pillar after failure at ~1 GPa stress. Magnification (3"x4" image): 45000X Instrument (Make and Model): Hitachi S4800 SEM Submitted by: Siddhartha Pathak and William M. Mook Affiliation: EMPA, Switzerland
HONORABLE MENTION
Title: New micro asteroid Description: Scouring the surface of our silicon world we detect an unknown asteroid Magnification (3"x4" image): 1789X Instrument (Make and Model): FEI Quanta 3D FEG Submitted by: V.G. Kutchoukov and P. Kruit Affiliation: Delft University of Technology, The Netherlands
HONORABLE MENTION
Title: Madonna Picasso Description: A failed pattern transfer of MIM stacks from a grating mold onto a PMMA- coated glass substrate. Magnification (3"x4" image): 124x Instrument (Make and Model): Instrument (Make and Model): Philips XL30 FEG SEM Submitted by: Alex Kaplan Affiliation: University of Michigan
HONORABLE MENTION
Title: Belching Trash Cans Description: Selective etching of GaAs/AlGaAs stacks on the GaAs substrate with hard mask residue Magnification (3"x4" image): 13KX Instrument (Make and Model): Philips XL30 FEG Submitted by: Yi-Kuei Wu Affiliation: EECS, University of Michigan, Ann Arbor HONORABLE MENTION
Title: "chrysanthemum" Description:SEM image of a chrysanthemum self-assembled from electron-beam-lithography-defined PMMA nanopillars due to the capillary force during the post-development rinse and drying process. The original thickness of PMMA was ~550 nm, and PMMA was used as a negative resist. Electron-beam lithography was done by Raith 150 with an accelerating voltage of 30 kV, beam current of ~400 pA. Magnification (5.18"x 6" image): 75,000x Instrument (Make and Model): Raith 150 Submitted by: Huigao Duan Affiliation: Massachusetts Institute of Technology HONORABLE MENTION
Title: Contratulations, it's a boy Description:These two whole cells had their micro villi entangled as if hugging. Magnification (3"x4" image): 4.6 kX Instrument (Make and Model): ORION Plus He Ion Microscope Submitted by: Shawn McVey and Dave Voci Affiliation: Carl Zeiss SMT HONORABLE MENTION
Title: Octopuses Garden Description: This is the membrane of a mouse cell with the micro-villi reaching up – just as snakes rise for the music of the serpent charmer. Magnification (3"x4" image): 23 kX Instrument (Make and Model): ORION Plus He Ion Microscope Submitted by: Shawn McVey and Dave Voci Affiliation: Carl Zeiss SMT HONORABLE MENTION
Title: Snow Flakes Description:The planar nature of the crystal formation process is plainly visible here. Magnification (3"x4" image): 17kX Instrument: Carl Zeiss, ORION Plus (He Ion Microscope) Submitted by: Lou Farkas and Dave Voci Affiliation: Carl Zeiss SMT
HONORABLE MENTION
Title: I can see my house from here Description:FIB image (Focused Ion Beam, Ga+) that shows a RIE (Reactive Ion Etching) result of an attack over an organic resist. Magnification (3"x4" image): 600 x Instrument (Make and Model): CrossBeam 1560xB (Carl Zeiss) Submitted by: Jordi Llobet1 & Aďda Varea2 Affiliation: 1IMB-CNM (CSIC) & 2 UAB - Barcelona HONORABLE MENTION
Title: Don't Jump! Description:Rod of cobalt overhanging a larger silicon rod, with the "shell" formed by cobalt chloride. Magnification (3"x4" image): 600 x Magnification (3"x4" image): 29000x Instrument (Make and Model): Zeiss Ultra55 Submitted by: Steven Hickman Affiliation: Cornell University
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